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  • 03-08
    2022
    [News] Magnetron sputtering coating application in common fields
    Magnetron sputtering​ method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage. Read More »
  • 03-07
    2022
    [News] Sputtering target why to bind back target
    Sputtering targets are mainly used in electronic information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc. It can also be used in glass coating, wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries. Bonding refers to bonding a target to a back target with solder. Read More »
  • 03-04
    2022
    [News] Ceramic targets-three main factors affecting the properties of it
    The purity of ceramic target​ has a great influence on the performance of sputtering film. The higher the purity is, the better the uniformity of sputtering film and the quality of batch products. In addition, in order to prepare high performance ceramic target, we should control these factors, mainly including molding method, raw material size, sintering effect, today to analyze the main factors affecting the performance of ceramic target are those. Read More »
  • 03-03
    2022
    [News] Aluminium nitride's application
    Aluminum nitride​ has high resistivity, high thermal conductivity (8-10 times of Al2O3), and low expansion coefficient similar to silicon, making it an ideal material for high temperature and high power electronic devices. Commonly used ceramic substrate materials are beryllium oxide, alumina, aluminum nitride, etc., among which alumina ceramic substrate thermal conductivity is low, thermal expansion coefficient and silicon do not match; Read More »
  • 03-02
    2022
    [News] What is chrome oxide powder?
    Chromic oxide green, hexagonal or amorphous dark green powder with metallic luster. It usually comes in two shades: light olive green and dark olive green, with metallic tints. Relative density 5.21, melting point: 2266℃, boiling point 4000℃. Excellent heat resistance, can withstand temperature 1000℃ without discoloration, acid resistance, alkali resistance is also quite good. High purity, small particle size, uniform distribution, crystal very hard. Read More »
  • 03-01
    2022
    [News] Cerium oxide in polishing
    Cerium oxide​ polishing powder (VK-CE01) polishing powder has the advantages of strong cutting ability, high polishing efficiency, high polishing accuracy, good polishing quality, clean operating environment, small pollution, long service life and so on, and plays an extremely important role in optical precision polishing and CMP and other fields. Read More »
  • 02-28
    2022
    [News] PVD sputtering target's introduction
    Physical vapor deposition (PVD) is a thin-film preparation technique that physically vaporizes the surface of a target into gaseous atoms, molecules, or parts into ions under vacuum conditions. A film with a specific function is then deposited on the surface of the substrate via a low-pressure gas (or plasma). The main methods of physical vapor deposition include vacuum evaporation, sputtering deposition, arc plasma plating, ion plating, etc. Read More »
  • 02-25
    2022
    [News] Targets-semiconductor manufacturing materials
    The target material​ is the material of making thin film, using the target material bombarded by high-speed charged particles, through different laser (ion beam) and different target material interaction to get different membrane system, to achieve the function of conduction and blocking. Therefore, the target is also called "sputtering target". His working principle is to use the ions generated by the ion source to gather and accelerate in vacuum Read More »
  • 02-24
    2022
    [News] The ternary materials
    Common cathode materials for lithium batteries mainly include lithium cobalt acid (LCO), lithium manganese acid (LMO), lithium iron phosphate (LFP), ternary materials (NCM/NCA), etc. Ternary (LICoxMNyNi1-X-YO2), with a-NafEO2 layered structure (R-3M space group), has a theoretical capacity of about 275 mAh/g. Read More »
  • 02-23
    2022
    [News] Semiconductor materials' characteristics and applications
    Semiconductor materials are a kind of electronic materials which have semiconductor properties and are used to make semiconductor devices. Semiconductor material is the foundation of semiconductor industry, and its development has great influence on the development of semiconductor technology. So what are the characteristics and applications of semiconductor materials? Read More »
  • 02-22
    2022
    [News] Optical crystal's introduction
    Optical Crystal is a kind of Crystal material used for Optical medium materials. It is widely used in making window pieces, lenses and prisms in various fields of ULTRAVIOLET and infrared application. According to the crystal structure is divided into single crystal and polycrystal. Single crystal materials have high crystal integrity and light transmittance, as well as low input loss, so common optical crystals are dominated by single crystal. Read More »
  • 02-21
    2022
    [News] Silicon carbide - third generation semiconductor material
    Semiconductor materials after decades of development, the first generation of silicon semiconductor material has been close to the perfect crystal, silicon material research is also very thorough. The design and development of devices based on silicon materials have gone through many generations of structural and technological optimization and update, and are gradually approaching the limit of silicon materials Read More »
  • 02-18
    2022
    [News] High purity sputtering targets for semiconductor chips
    Sputtering target​ is the most important factor to determine the yield of semiconductor. So applied to the semiconductor and the required precision degree, is the highest purity, degree of purity of sputtering target materials and precision will directly affect the performance of semiconductor, the difference of sputtering target materials is the most direct consequences caused semiconductor short circuit Read More »
  • 02-17
    2022
    [News] Cobalt powder's performance and application
    1. High density magnetic recording material can greatly improve the performance of tape and large-capacity hard and soft disks by using the advantages of high recording density, high coercivity (up to 119.4KA/m), high signal-to-noise ratio and good oxidation resistance of nano-cobalt powder; 2. Magnetic fluid with iron, cobalt, nickel and their alloy powder production of excellent performance, can be widely used in sealing shock absorption, sound regulation, light display, etc; Read More »
  • 02-16
    2022
    [News] Zinc oxide's application
    Zinc oxide​ has a large band gap and exciton binding energy, high transparency, excellent luminescence performance at room temperature, and has been used in the semiconductor field of LIQUID crystal display, thin film transistors, light-emitting diodes and other products. In addition, as a kind of nanomaterial, microgranular zinc oxide has also begun to play a role in related fields. Read More »
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  Address : B-304, No.69, Gazelle Valley, Jinye Road, High-Tech Zone, Xi'an City, Shaanxi Province, P.R.China
 Tel :   +86-29-88993870 
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