In the chip industry, sputtering target​ is a necessary raw material for vlSI manufacturing. Which makes use of the ion, ion source through accelerating gathered in the high vacuum, and the formation of a high speed can ion beam, the bombardment of solid surface, ions and solid surface atomic momentum exchange, from solid surface atomic solid and deposition in the basal surface, bombarded solid is sputtering deposition film of raw materials, known as the sputtering target materials. Read More »

Sputtering targets are mainly used in electronic information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc. It can also be used in glass coating, wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries. Bonding refers to bonding a target to a back target with solder. Read More »

The purity of ceramic target​ has a great influence on the performance of sputtering film. The higher the purity is, the better the uniformity of sputtering film and the quality of batch products. In addition, in order to prepare high performance ceramic target, we should control these factors, mainly including molding method, raw material size, sintering effect, today to analyze the main factors affecting the performance of ceramic target are those. Read More »

The target material​ is the material of making thin film, using the target material bombarded by high-speed charged particles, through different laser (ion beam) and different target material interaction to get different membrane system, to achieve the function of conduction and blocking. Therefore, the target is also called "sputtering target". His working principle is to use the ions generated by the ion source to gather and accelerate in vacuum Read More »

Sputtering target​ is the most important factor to determine the yield of semiconductor. So applied to the semiconductor and the required precision degree, is the highest purity, degree of purity of sputtering target materials and precision will directly affect the performance of semiconductor, the difference of sputtering target materials is the most direct consequences caused semiconductor short circuit Read More »

Magnetron sputtering coating is a new physical gas phase coating method, which is to use the electron gun system to emit electrons and focus on the coated material, so that the sputtering atoms follow the momentum conversion principle to fly away from the material with a high kinetic energy to the substrate deposition film. This plated material is called the sputtering target. Read More »

Metal target Nickel, Ni, titanium, Ti, zinc, Zn, Chromium, Cr, Magnesium, Mg, niobium, Nb, tin, Sn, Aluminum, Al, indium, In, Iron, Fe, zirconium, ZrAl, Titanium-aluminum, TiAl, zirconium, Zr, aluminum-silicon, AlSi, Silicon, Si, Copper, Cu, tantalum, T, A, Ge , Silver target, Ag target, cobalt target, Co target, gold target, Au target, gadolinium target Read More »

On September 27, the Ministry of Ecology and Environment held a briefing on climate change policies. Introduced the related to climate change policies in China and the basic position, the ecological environment, director-general of the department of climate change li, during the period of "differe Read More »

Recently, a kind of electrolytic aluminum energy saving artifact called portable pre-tank superheat real-time measuring instrument has been developed successfully.The measuring instrument is developed by Beijing Core Power Technology Co., Ltd. on the basis of the original crystal temperature measuri Read More »

Recently, the Serbian zijin copper held "KuangGongJie" ceremony, Serbia's mining and energy minister antic attended the ceremony, and presented four employees with "Š isteck engineer" award. Minister Antic pointed out that in the first half of 2020, under the situation of epidemic prevention and co Read More »

A month after the successful launch of a Long March 3B carrier rocket carrying the Beidou-3, a Long March 5 rocket blasted off at 12:41 am on July 23, lifting China's domestically developed Mars Probe Tianwen-1.They are composing the grand prelude of the symphony of China's space power in space and Read More »