Gallium nitride (GaN) is a kind of semiconductor material composed of nitrogen and gallium. Because its band gap width is greater than 2.2eV, it is also known as wide band gap semiconductor material, and also known as the third generation semiconductor material in China. Read More »

Molybdenum disulfide is an important solid lubricant, especially suitable for high temperature and high pressure. It also has diamagnetic, can be used as a linear photoconductor and display p-type or n-type conductivity of semiconductors, with the role of rectification and energy conversion. Molybdenum disulfide can also be used as a catalyst for the dehydrogenation of complex hydrocarbons. Read More »

Copper Zinc Tin sulfur selenium cu2ZnSnSXSE4-X (CZTSSe) is a new generation of light absorption layer material for thin film solar cells. The material has similar crystal structure and material properties to copper indium gallium selenium CuInXGa1-XSe2 (CIGS), which is currently outstanding in the field of thin film solar cells. Copper, Zinc, tin, sulfur and selenium have high light absorption coefficient (greater than 104cm-1), adjustable band gap (1.0-1.5eV) and good photodepletion resistance. Read More »

Magnetron sputtering method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage. Read More »

High purity sputtering target, including aluminum target, titanium target, tantalum target, tungsten titanium target, etc. Sputtering target mainly involves four fields: flat panel display, semiconductor, storage and solar cell. Read More »

In the application products of magnesium alloy, pressure machining products, casting products and non-structural applications are three major trends. Read More »

There are many causes affecting the transmittance of a plane lens by optical coating. The roughness of the mirror will cause the diffuse of incident light and reduce the transmittance of the lens. Read More »

High purity sputtering target applications mainly include semiconductor, panel, photovoltaic and optical devices. Integrated circuits, flat panel display, solar cells, information storage, tool modification, optical devices, high-grade decorative products and other production processes need to carry out sputtering coating process, sputtering target application field is very broad. Read More »

At present, the main technology of alloying element addition in China includes intermediate alloy addition and alloying element additive addition.The technology of adding intermediate alloy began to be used in China from 1950s to late 1960s. Read More »

Lithium cobalt oxide is a chemical compound with the chemical formula of formula LiCoO2. Lithium cobalt oxide is a dark blue or bluish-gray crystalline solid and is commonly used in the positive electrodes of lithium-ion batteries.As all we may know lithium ion batteries are used in household electronics like mobile phones and laptop and these batteries are considered as the most promising energy storage and conversion device candidates for use in future electric vehicle applications because of having very high energy density. Read More »

Silicon nitride is a kind of high hardness, stable structure, low thermal expansion coefficient, oxidation resistance and erosion resistance is very good set of excellent thermal and chemical properties of advanced ceramic materials. Read More »

Gallium arsenide (GaAs) semiconductor materials have high electron mobility (about 5.7 times that of silicon) and wide band gap structure compared with traditional silicon materials. Read More »

High purity metal sputtering target material is mainly used in wafer manufacturing and advanced packaging process. Read More »

In the fluorescent lamp socket near the common blackening phenomenon, which is the most admired example, this is due to the fluorescent lamp electrode is sputtered and attached to the surrounding formation. Read More »

Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic. Read More »