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Views: 7 Author: Site Editor Publish Time: 2021-11-16 Origin: Site
Magnetron sputtering method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage.
Various functions of film: such as absorption, transmission, reflection, refraction, polarization and other functions. For example, silicon nitride antireflective film is deposited at low temperature to improve the photoelectric conversion efficiency of solar cells.
Microelectronics: can be used as a non-hot coating technology, mainly for chemical vapor deposition (CVD).
Application in the field of decoration: such as all kinds of total reflection film and translucent film; Such as mobile phone case, mouse and so on.
Some materials unsuitable for chemical vapor deposition (MOCVD) can be deposited by magnetron sputtering, which can obtain uniform large area films.
Mechanical industry: such as surface functional film, superhard film, self-lubricating film, etc. These films can effectively improve surface hardness, compound toughness, wear resistance and high temperature chemical stability, thus greatly increasing the service life of products.
Optical field: closed field non-equilibrium magnetron sputtering technology has also been applied to optical films (such as anti-reflection film), low radiation glass and transparent conductive glass. In particular, transparent conductive glass is widely used in flat panel display devices, solar cells, microwave and RF shielding devices and devices, sensors, etc.
In addition to the above fields, magnetron sputtering also plays an important role in the research of HTS thin films, ferroelectric thin films, giant magnetoresistance thin films, thin film luminescent materials, solar cells, memory alloy thin films.
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