Annoucement : Welcome to visit our website, Any inquiry, please check CONTACT US. Payment related business, please confirm with our salesman, Have a nice visit trip.
FUNCMATER
  +86-029-88993870               sales@funcmater.com
You are here: Home » News

Calcium Oxide Sputtering Target

These are related to the Calcium Oxide Sputtering Target news, in which you can learn about the latest trends in Calcium Oxide Sputtering Target and related information industry, to help you better understand and expand Calcium Oxide Sputtering Target market.
  • 05-20
    2022
    [News] Sputtering target - "neglected" core consumables
    Target material​ is one of the main materials for preparing thin films, which is mainly used in integrated circuits, flat panel displays, solar cells, recording media, intelligent glass, etc., which requires high purity and stability of materials. Sputtering target working principle: Sputtering is one of the main technology of preparation of thin film materials, which makes use of the ion Read More »
  • 03-17
    2022
    [News] PVD coating color corresponding to various targets
    Choose target material​ types, material and gas (nitrogen, oxygen, acetylene, methane, argon gas, etc.), determine the target material and gas species, and then adjust the gas ratio, the dosage, the sputtering power, sputtering time, processing temperature, the substrate sputtering process parameters, such as temperature, sputtering time, preparation of color film, widely used in decorative coating industry. Read More »
  • 02-25
    2022
    [News] Targets-semiconductor manufacturing materials
    The target material​ is the material of making thin film, using the target material bombarded by high-speed charged particles, through different laser (ion beam) and different target material interaction to get different membrane system, to achieve the function of conduction and blocking. Therefore, the target is also called "sputtering target". His working principle is to use the ions generated by the ion source to gather and accelerate in vacuum Read More »
  • 02-18
    2022
    [News] High purity sputtering targets for semiconductor chips
    Sputtering target​ is the most important factor to determine the yield of semiconductor. So applied to the semiconductor and the required precision degree, is the highest purity, degree of purity of sputtering target materials and precision will directly affect the performance of semiconductor, the difference of sputtering target materials is the most direct consequences caused semiconductor short circuit Read More »
  • 01-14
    2022
    [News] Target materials' classification
    Metal target Nickel, Ni, titanium, Ti, zinc, Zn, Chromium, Cr, Magnesium, Mg, niobium, Nb, tin, Sn, Aluminum, Al, indium, In, Iron, Fe, zirconium, ZrAl, Titanium-aluminum, TiAl, zirconium, Zr, aluminum-silicon, AlSi, Silicon, Si, Copper, Cu, tantalum, T, A, Ge , Silver target, Ag target, cobalt target, Co target, gold target, Au target, gadolinium target Read More »

CONTACT US

 Address : No. 69, Gazelle Valley, High-Tech  Zone Xi’an City,Shaanxi Province, P.R.China
 Tel :  +86-29-88993870
 Fax : +86-29-89389972
 E-mail : sales@funcmater.com
 WeChat: railwaydu 
                      L106174941

Information

  Address : No. 69,Gazelle Valley, High-    Tech Zone Xi’an City,Shaanxi Province, P.R.China
 Tel :   +86-29-88993870 
              +86-13519132051
 Fax :  +86-29-89389972
 E-mail : sales@funcmater.com
                   timdu@funcmater.com
 Purchase email : chris@funcmater.com
 Wechat: railwaydu
                       L106174941 

Global Agents

We are recruiting global agents, If you're interested, Join us!
Contact Us
Copyright  2021 XI'AN FUNCTION MATERIAL GROUP CO.,LTD
Sitemap   |   Support By GoodWaimao