Target material​ is one of the main materials for preparing thin films, which is mainly used in integrated circuits, flat panel displays, solar cells, recording media, intelligent glass, etc., which requires high purity and stability of materials. Sputtering target working principle: Sputtering is one of the main technology of preparation of thin film materials, which makes use of the ion Read More »

Choose target material​ types, material and gas (nitrogen, oxygen, acetylene, methane, argon gas, etc.), determine the target material and gas species, and then adjust the gas ratio, the dosage, the sputtering power, sputtering time, processing temperature, the substrate sputtering process parameters, such as temperature, sputtering time, preparation of color film, widely used in decorative coating industry. Read More »

The target material​ is the material of making thin film, using the target material bombarded by high-speed charged particles, through different laser (ion beam) and different target material interaction to get different membrane system, to achieve the function of conduction and blocking. Therefore, the target is also called "sputtering target". His working principle is to use the ions generated by the ion source to gather and accelerate in vacuum Read More »

The long-awaited titanium cup finally has an industry standard.This is the standard for titanium cup products, and it is also the standard for consumers' cognition of titanium cup. It marks a good beginning for the gradual formulation of standards for titanium civil life products. It is reported tha Read More »

3.Titanium wants to be still, but the wind doesn't stopTitanium to static and the wind, the wind more than titanium difficult static.Shortly after entering the 21st century, China's titanium industry has developed into the world's largest titanium producer and consumer goods country, catching up wit Read More »