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Aluminum Oxynitride Sodium Oxide Sputtering Target

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  • 05-13
    2022
    [News] Semiconductor chip material king- sputtering target material
    In the chip industry, sputtering target​ is a necessary raw material for vlSI manufacturing. Which makes use of the ion, ion source through accelerating gathered in the high vacuum, and the formation of a high speed can ion beam, the bombardment of solid surface, ions and solid surface atomic momentum exchange, from solid surface atomic solid and deposition in the basal surface, bombarded solid is sputtering deposition film of raw materials, known as the sputtering target materials. Read More »
  • 03-07
    2022
    [News] Sputtering target why to bind back target
    Sputtering targets are mainly used in electronic information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc. It can also be used in glass coating, wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries. Bonding refers to bonding a target to a back target with solder. Read More »
  • 03-04
    2022
    [News] Ceramic targets-three main factors affecting the properties of it
    The purity of ceramic target​ has a great influence on the performance of sputtering film. The higher the purity is, the better the uniformity of sputtering film and the quality of batch products. In addition, in order to prepare high performance ceramic target, we should control these factors, mainly including molding method, raw material size, sintering effect, today to analyze the main factors affecting the performance of ceramic target are those. Read More »
  • 02-18
    2022
    [News] High purity sputtering targets for semiconductor chips
    Sputtering target​ is the most important factor to determine the yield of semiconductor. So applied to the semiconductor and the required precision degree, is the highest purity, degree of purity of sputtering target materials and precision will directly affect the performance of semiconductor, the difference of sputtering target materials is the most direct consequences caused semiconductor short circuit Read More »
  • 02-03
    2022
    [News] What is sputtering target?
    Magnetron sputtering coating is a new physical gas phase coating method, which is to use the electron gun system to emit electrons and focus on the coated material, so that the sputtering atoms follow the momentum conversion principle to fly away from the material with a high kinetic energy to the substrate deposition film. This plated material is called the sputtering target. Read More »
  • 09-09
    2020
    [News] A portable instant superheat measuring instrument for electrolytic aluminum has been developed successfully
    Recently, a kind of electrolytic aluminum energy saving artifact called portable pre-tank superheat real-time measuring instrument has been developed successfully.The measuring instrument is developed by Beijing Core Power Technology Co., Ltd. on the basis of the original crystal temperature measuri Read More »
  • 07-30
    2020
    [News] Efficient and inexpensive sodium batteries are available
    According to a report by THE WEBSITE of Russia Today on July 15, scientists in Russia and Germany have developed a new process for making sodium batteries.The sodium battery can replace the current use of lithium batteries, has many advantages: a significant reduction in the manufacturing cost, lith Read More »

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