Application of plasma in surface coating technology

Sputtering deposition

Sputtering is the use of high speed ion impact solid sputtering target, so that the surface molecules splash and projected onto the substrate to form a film. The initial kinetic energy of the sputtering ion is about 100 eV.A common plasma gas is argon.

Plasma-assisted deposition

Gas phase chemical deposition the chemical reaction is carried out on a high-temperature substrate to obtain sufficient gas precursor energy response.

Plasma polymerization

The simplest technique for coating a polymer or plastic film is to apply it to a solvent and then to a substrate.Plasma polymerization coating method is to excite the molecular monomer into plasma, through chemical reaction, to form a uniform polymer, coated on the substrate.Due to the impact of plasma on the substrate, the adhesion is also very strong.

Plasma etching

Wet alkali etching is the simplest and cheapest method, the disadvantage is that alkali etching has crystal plane orientation, will cause the bottom cutting problem.

Plasma spraying

Metal parts working at high temperatures must be covered with ceramic to prevent high temperature corrosion.