In the quest for sustainable energy solutions, energy storage technologies play a pivotal role in enabling the widespread adoption of renewable energy sources. Among the various materials utilized in energy storage systems, Vanadium Pentoxide (V2O5) pellets have emerged as a promising candidate. The Read More »

Magnetron sputtering​ method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage. Read More »

At present, the target materials are mainly prepared by casting and powder metallurgy. 1. Casting method: the alloy raw material with a certain composition ratio is melted, and then the alloy solution is poured into the mold to form ingot, and finally the target is made by mechanical processing, and the casting method is melted and cast in vacuum. Read More »

Sputtering is the use of high speed ion impact solid sputtering target, so that the surface molecules splash and projected onto the substrate to form a film.The initial kinetic energy of the sputtering ion is about 100 eV.A common plasma gas is argon. Read More »