Titanium Metal (Ti)-Rotary Sputtering Target

Characteristic

Titanium rotating target material with high melting point, nonmagnetic, low thermal expansion coefficient, specific strength and specific stiffness and good corrosion resistance, high resistance to many excellent properties, such as biological erosion into areas such as aviation, spaceflight, Marine vessels indispensable key material, and in the chemical, energy, oil, biological medicine, etc many applications received more and more.

For making ceramic titanium aluminum alloy film, mainly used for decorative plating and tool plating, semiconductor electronic products chemical composition and physical properties.

Application

In the information storage industry, the storage capacity of magnetic memory is constantly increasing, and new magneto-optical recording materials are constantly innovating. All these put forward higher and higher requirements for the quality of sputtering target materials, and the number of demands is also increasing year by year.