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7440-74-6
In
4900RT
99.9%-99.995%
Customized
231-180-0
Characteristic
Sputtering target material is the raw material of thin film deposited by sputtering method, which is mainly used in the field of panel display, semiconductor and magnetic recording thin film solar energy.
The purity of our indium rotating target can be 4N5.
Application
It is a kind of giant magnetoresistance thin film material used in microelectronic field, plane display and storage.
Characteristic
Sputtering target material is the raw material of thin film deposited by sputtering method, which is mainly used in the field of panel display, semiconductor and magnetic recording thin film solar energy.
The purity of our indium rotating target can be 4N5.
Application
It is a kind of giant magnetoresistance thin film material used in microelectronic field, plane display and storage.
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