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You are here: Home » Thin film coating materials » Rotary Sputtering Target » Rotary Sputering Target » Aluminum Metal (Al)-Rotary Sputtering Target

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Aluminum Metal (Al)-Rotary Sputtering Target

  • 7429-90-5

  • Al

  • 1300RT

  • 99.99%-99.9999%

  • Customized

  • 231-072-3

Availability:

Characteristic


Chemical composition and physical properties of the product:

Chemical formula: Al

Molding process: spraying

Density: > 2.6 g/cm3

Purity: > 99.9%

Impurity content (unit: PPM, total impurity content ≤ 1000ppm)


Application


Mainly used for surface decoration and functional coating and evaporation materials, semiconductor electronics, TFT, flat display.

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  Address : No. 69,Gazelle Valley, High-    Tech Zone Xi’an City,Shaanxi Province, P.R.China
 Tel :   +86-29-88993870 
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