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Aluminum Metal (Al)-Rotary Sputtering Target

  • 7429-90-5
  • Al
  • 1300RT
  • 99.99%-99.9999%
  • Customized
  • 231-072-3
Availability:

Characteristic


Chemical composition and physical properties of the product:

Chemical formula: Al

Molding process: spraying

Density: > 2.6 g/cm3

Purity: > 99.9%

Impurity content (unit: PPM, total impurity content ≤ 1000ppm)


Application


Mainly used for surface decoration and functional coating and evaporation materials, semiconductor electronics, TFT, flat display.

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