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You are here: Home » Inorganic powder materials » Rotary Sputtering Target » Spray Rotary Sputtering Target » Silicon (Si)-Spray Rotary Sputtering Target

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Silicon (Si)-Spray Rotary Sputtering Target

  • 7440-21-3
  • Si
  • 1400SRT
  • ≥99.9%
  • Customized
  • 231-130-8
Availability:

Characteristic


Silicon is an important kind of sputtering target materials, mainly used in the reaction system of magnetron sputtering plating SiO2 and SiN dielectric layer, as an important functional thin film materials, they have good hardness, optical and dielectric properties and wear resistance, corrosion resistance and other characteristics, in optics, microelectronics, and other fields has a broad prospect of application and functional materials are widely international attention.


Generally, silicon targets can be divided into single crystal and polycrystalline types.


Application


Used for making SiO2/Si3N4 film, mainly used for optical glass, AR film system of touch screen, Low-E coated glass, semiconductor electronics, flat display, touch screen.

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