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You are here: Home » Products » Thin film coating materials » Ceramic Sputtering Targets » Silicide Ceramic Sputtering Target » Titanium Silicide (TiSi2)-Sputtering Target

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Titanium Silicide (TiSi2)-Sputtering Target

  • 12039-83-7

  • TiSi2

  • 221400ST

  • 99.5%

  • Dia:50.8mmx 6.35mm

  • 235-082-9

Availability:

Characteristic

 

Titanium disilicide (TiSi2) is an inorganic chemical compound.


Chemical formula:TiSi2

Molar mass:104.038 g/mol

Appearance:black orthorhombic crystals

Density:4.02 g/cm3

Melting point:1,470 °C (2,680 °F; 1,740 K)

Solubility in water:insoluble

Solubility: soluble in HF

 

Application

 

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.


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