Silicon Nitride (Si3N4)-Sputtering Target

Characteristic

Silicon nitride is a chemical compound of the elements silicon and nitrogen. Si₃N₄ is the most thermodynamically stable of the silicon nitrides. Hence, Si₃N₄ is the most commercially important of the silicon nitrides and is generally understood as what is being referred to where the term "silicon nitride" is used. It is a white, high-melting-point solid that is relatively chemically inert, being attacked by dilute HF and hot H2SO4. It is very hard (8.5 on the mohs scale). It has a high thermal stability.

Chemical formula：Si₃N₄

Molar mass：140.283 g·mol⁻¹

Appearance：grey, odorless powder

Density：3.17 g/cm³

Melting point：1,900 °C (3,450 °F; 2,170 K)

Solubility in water：Insoluble

Refractive index (nD)：2.016

Application

Silicon nitride is used as high grade refractory, such as si₃n₄-sic refractory combined with sic for blast furnace body and other parts;If combined with BN as Si₃N₄-BN material, used for horizontal continuous casting separation ring. Si₃N₄-BN series horizontal continuous casting separation ring is a kind of fine structure ceramic material with uniform structure and high mechanical strength.Good resistance to impact, and will not be wetted by molten steel, in line with the continuous casting process requirements.

Used for preparation of thermal interface composite materials, photovoltaic demultifier, phosphor powder, preparation of special ceramics.