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10097-28-6
SiO
140800PC
99.9 %-99.99 %
3 - 12 mm/6 - 15 mm
233-232-8
Characteristic
Silicon monoxide is an inorganic compound, its chemical formula is SiO, under normal temperature and pressure is black brown to loess color amorphous powder, insoluble in water, can dissolve in dilute hydrofluoric acid and nitric acid mixed acid and release silicon tetrafluoride, when heated in the air to produce white silicon dioxide powder.Silicon monoxide is unstable and oxidizes into silica in the air.
Chemical formula：SiO
Molar mass：44.08 g/mol
Appearance：brown-black glassy solid
Density：2.13 g/cm3
Melting point：1,702 °C (3,096 °F; 1,975 K)
Boiling point：1,880 °C (3,420 °F; 2,150 K)
Solubility in water：insoluble
Application
Because of its high activity, silicon monoxide powder can be used as raw materials for fine ceramic synthesis, such as silicon nitride and silicon carbide fine ceramic powder. Preparation of optical glass and semiconductor materials.
It is evaporated in a vacuum, and coated on a metal mirror surface for optical instruments as a protective film. Preparation of semiconductor materials.
Characteristic
Silicon monoxide is an inorganic compound, its chemical formula is SiO, under normal temperature and pressure is black brown to loess color amorphous powder, insoluble in water, can dissolve in dilute hydrofluoric acid and nitric acid mixed acid and release silicon tetrafluoride, when heated in the air to produce white silicon dioxide powder.Silicon monoxide is unstable and oxidizes into silica in the air.
Chemical formula：SiO
Molar mass：44.08 g/mol
Appearance：brown-black glassy solid
Density：2.13 g/cm3
Melting point：1,702 °C (3,096 °F; 1,975 K)
Boiling point：1,880 °C (3,420 °F; 2,150 K)
Solubility in water：insoluble
Application
Because of its high activity, silicon monoxide powder can be used as raw materials for fine ceramic synthesis, such as silicon nitride and silicon carbide fine ceramic powder. Preparation of optical glass and semiconductor materials.
It is evaporated in a vacuum, and coated on a metal mirror surface for optical instruments as a protective film. Preparation of semiconductor materials.
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