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You are here: Home » Products » Thin film coating materials » Ceramic Sputtering Targets » Oxide Ceramic Sputtering Target » Silicon Dioxide (SiO2)-Sputtering Target

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Silicon Dioxide (SiO2)-Sputtering Target

  • 14808-60-7

  • SiO2

  • 140801ST

  • 99.99 %-99.999 %

  • 3 inch dia x 0.25 inch th.etc

  • 238-878-4

Availability:

Characteristic


Silicon dioxide, also known as silica, is an oxide of silicon with the chemical formula SiO2, most commonly found in nature as quartz and in various living organisms. is an acidic oxide, corresponding to the hydrate is silicate (H2SiO3).Silicon dioxide is one of the most complex and abundant families of materials, both mineral and synthetic.SiO2 crystal has a variety of crystal types, and its basic structural unit is tetrahedron.


Chemical formula:SiO2

Molar mass:60.08 g/mol

Appearance:Transparent solid (Amorphous) ;White/Whitish Yellow (Powder/Sand)

Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3

Melting point:1,713 °C (3,115 °F; 1,986 K) 

Boiling point:2,950 °C (5,340 °F; 3,220 K)

Magnetic susceptibility (χ):−29.6·10−6 cm3/mol

Thermal conductivity:12 (|| c-axis), 6.8 (⊥ c-axis), 1.4 (am.) W/(m⋅K)(p12.213)

Refractive index (nD):1.544 (o), 1.553 (e)(p4.143)


Application


The network structure of SiO2 determines its excellent physical and chemical properties. In addition, SiO2 is widely existed in nature and has been widely used by humans since ancient times.Silica and other compounds are fused at high temperatures and rapidly cooled to produce glass.It is also a major component of sand and quartz.It is the main raw material for semiconductor and solar panel applications.


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