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Characteristic
Cobalt silicide is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered.
Chemical formula:CoSi2
Density:5.30g/cm3
Melting Point:1277°C
Application
Cobalt silicide is widely used in chemical research. It is also used for the production and characterization of very-large-scale integration (VLSI) applications in semiconductors.
Characteristic
Cobalt silicide is generally immediately available in most volumes. High purity, submicron and nanopowder forms may be considered.
Chemical formula:CoSi2
Density:5.30g/cm3
Melting Point:1277°C
Application
Cobalt silicide is widely used in chemical research. It is also used for the production and characterization of very-large-scale integration (VLSI) applications in semiconductors.
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