Choose target material​ types, material and gas (nitrogen, oxygen, acetylene, methane, argon gas, etc.), determine the target material and gas species, and then adjust the gas ratio, the dosage, the sputtering power, sputtering time, processing temperature, the substrate sputtering process parameters, such as temperature, sputtering time, preparation of color film, widely used in decorative coating industry. Read More »

Sputtering target​ is the most important factor to determine the yield of semiconductor. So applied to the semiconductor and the required precision degree, is the highest purity, degree of purity of sputtering target materials and precision will directly affect the performance of semiconductor, the difference of sputtering target materials is the most direct consequences caused semiconductor short circuit Read More »

As of March 18, domestic electrolytic aluminum spot inventory was 1.25 million tons, an increase of 228,000 tons compared with February 22.According to historical experience, it will go to the library again in 1-2 weeks.Electrolytic aluminum disk profit "full".As of March 22, Shandong regional profi Read More »

Compared with other materials, low-dimensional disulfide nanocrystals are widely regarded as a promising cathode material for lithium ion batteries due to their layered structure and large surface area.Compared with the commercial anode materials, the cathode containning sheet-shape nanometer ws2 ma Read More »