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12055-23-1
HfO2
720800NPD
99.5%
100nm
235-013-2
Color: White
Form: Nearly Spherical
BET: 20.43 (m2/g)
Bulk Density: 1.28 (g/cm3)
1. Nano hafnium dioxide powder has high purity, small particle size, uniform distribution, large specific surface area, high surface activity, low loose density, gas phase preparation, overcoming the shortcomings of hard agglomeration, difficult to disperse, low purity of particles prepared by wet chemical method on the market;
2. High purity, less impurity content, in line with the requirements of electronic grade powder materials, can be used in electronics, alloy and temperature resistant ceramics, composite materials and other fields;
3. Nano hafnium dioxide is a non-toxic, tasteless white solid, insoluble in water, hydrochloric acid and nitric acid, soluble in concentrated sulfuric acid and hydrofluoric acid; Chemical properties are not active, with thin film characteristics: transmittance range ~ 220 ~ 12000nm; Refractive index (250nm) ~ 2.15 (500nm) ~ 2, and high melting point, so it is widely used.
1. Raw materials of metal hafnium and its compounds;
2. Refractories, radiation-resistant coatings and special catalysts;
3. High strength glass coating;
4. High temperature resistant composite coatings for aircraft and aerospace.
Color: White
Form: Nearly Spherical
BET: 20.43 (m2/g)
Bulk Density: 1.28 (g/cm3)
1. Nano hafnium dioxide powder has high purity, small particle size, uniform distribution, large specific surface area, high surface activity, low loose density, gas phase preparation, overcoming the shortcomings of hard agglomeration, difficult to disperse, low purity of particles prepared by wet chemical method on the market;
2. High purity, less impurity content, in line with the requirements of electronic grade powder materials, can be used in electronics, alloy and temperature resistant ceramics, composite materials and other fields;
3. Nano hafnium dioxide is a non-toxic, tasteless white solid, insoluble in water, hydrochloric acid and nitric acid, soluble in concentrated sulfuric acid and hydrofluoric acid; Chemical properties are not active, with thin film characteristics: transmittance range ~ 220 ~ 12000nm; Refractive index (250nm) ~ 2.15 (500nm) ~ 2, and high melting point, so it is widely used.
1. Raw materials of metal hafnium and its compounds;
2. Refractories, radiation-resistant coatings and special catalysts;
3. High strength glass coating;
4. High temperature resistant composite coatings for aircraft and aerospace.
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