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You are here: Home » Products » Thin film coating materials » Ceramic Sputtering Targets » Boride Ceramic Sputtering Target » Vanadium Boride (VB2)-Sputtering Target

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Vanadium Boride (VB2)-Sputtering Target

  • 12007-37-3

  • VB2

  • 230500ST

  • 99.5%-99.9 %

  • 1 inch dia x 0.25 inch th.etc

  • 234-509-6

Availability:

Characteristic


Vanadium diboride (VB2) has a hexagon crystal structure with a melting point of 2980 ° c, a high hardness, and an oxidation resistance of 1000 ° c. It can be used in conductive ceramic materials and other fields, belonging to the atomic crystal.


Molecular formula: VB2

Molar mass: 72.56 g/mol

Density: 5.10g/cm3.

Melting point: 2980 ℃


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