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You are here: Home » Thin film coating materials » Inorganic Compound Chemicals » Boride » Hafnium Boride » Hafnium Boride (HfB2)-Sputtering Target

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Hafnium Boride (HfB2)-Sputtering Target

  • 12007-23-7

  • HfB2

  • 720500ST

  • 99.5%

  • 3 inch dia x 0.25 inch th.etc

  • 234-500-7

Availability:

Characteristic


Hafnium diboride belong to the class of Ultra-high-temperature ceramics, a type of ceramic composed of hafnium and boron. It has a melting temperature of about 3250 degrees Celsius. It is an unusual ceramic, having relatively high thermal and electrical conductivities, properties it shares with isostructural titanium diboride and zirconium diboride. It is a grey, metallic looking material. Hafnium diboride has a hexagonal crystal structure, a molar mass of 200.11 grams per mole, and a density of 10.5 grams per cubic centimeter.


Chemical formula:HfB2

Molar mass:200.11 g/mol

Density:10.5 g/cm3

Melting point:ca. 3,250 °C (5,880 °F; 3,520 K)

Crystal structure:Hexagonal, hP3



Application


Hafnium diboride is also investigated as a possible new material for nuclear reactor control rods. It is also being investigated as a microchip diffusion barrier. If synthesized correctly, the barrier can be less than 7 nm in thickness.


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