Article List

• What is the working principle of sputtering target?

  Sputtering is one of the main technology of preparation of thin film materials, which makes use of the ion, ion source through accelerating gathered in a vacuum, and the formation of a high speed can ion beam, the bombardment of solid surface, ions and solid surface atomic momentum exchange, from solid surface atomic solid and deposition in the basal surface, as the solid bombarded sputtering target materials.

  News November 29, 2021
• What are the characteristics and preparation methods of nano-metal powder?

  High efficiency catalyst: nano-powder has the characteristics of high activity, large specific surface area so that it is often suitable for use as a catalyst. Experimental results show that nanometer cobalt powder, zinc powder and so on have strong catalytic effect.

  News December 08, 2021
• The boron nitride characteristics and application scope

  Boron nitride is a white material that has the properties of graphite. It is a crystal made of nitrogen and boron atoms. There are different variants, the main use of hexagonal boron nitride and cubic boron nitride.

  News December 01, 2021
• What is optical coating?

  Optical coating refers to the process of plating a layer (or multilayer) of metal (or medium) film on the surface of optical parts. The purpose of coating the surface of optical parts is to reduce or increase the reflection, beam splitting, color separation, filtering, polarization and other requirements of light.

  News November 30, 2021
• Four main forming methods for ITO target material

  As we all know, ITO sputtering target is a black gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proportion in a high temperature atmosphere (1600 degrees, oxygen sintering) through a series of production processes. ITO target was used as raw material to oxidize ITO film to glass substrate or flexible organic film by magnetron sputtering. ITO film has conductivity and light transmission, and its thickness is generally 30nm ~ 200nm.

  News December 03, 2021
• Use of zirconia balls

  Zirconia ball belongs to a class of grinding beads, its density 6.0, bulk density 3.2, zirconium 95%, containing about 4.8% yttrium, also known as 95 yttrium stable zirconia ball.

  News December 02, 2021
• Third generation semiconductor - gallium nitride

  Gallium nitride (GaN) is a kind of semiconductor material composed of nitrogen and gallium. Because its band gap width is greater than 2.2eV, it is also known as wide band gap semiconductor material, and also known as the third generation semiconductor material in China.

  News November 19, 2021
• What are the metal materials for 3D printing?

  According to the type of materials, 3D printing metal materials can be divided into iron based alloy, titanium and titanium based alloy, nickel based alloy, cobalt chromium alloy, aluminum alloy, copper alloy and precious metal, etc.

  News November 26, 2021
• Development and status quo of cathode materials for lithium batteries

  At present, the cathode materials of lithium batteries are mainly lithium cobalt acid, lithium manganese acid, lithium iron phosphate and ternary materials. The first stage of the rise of lithium battery cathode materials was dominated by lithium cobalt oxide (LCO) from 2005 to 2011.

  News November 25, 2021
• Nano cerium oxide

  Cerium oxide is a kind of inorganic substance, chemical formula for CeO2, light yellow or yellowish brown powder. Density 7.13g/cm3, melting point 2397℃, insoluble in water and alkali, slightly soluble in acid.

  News November 24, 2021