Article List

• What is a target? -- "neglected" core consumables

  Target material is one of the main materials for preparing thin films, which is mainly used in integrated circuits, flat panel displays, solar cells, recording media, intelligent glass, etc., which requires high purity and stability of materials.

  News November 23, 2021
• Sputtering target material used in semiconductor industry

  In today's semiconductor manufacturing process, sputtering target is undoubtedly the most important raw material, and its quality and purity play a key role in the subsequent production quality of the semiconductor industry chain.

  News November 22, 2021
• The use of molybdenum disulfide

  Molybdenum disulfide is an important solid lubricant, especially suitable for high temperature and high pressure. It also has diamagnetic, can be used as a linear photoconductor and display p-type or n-type conductivity of semiconductors, with the role of rectification and energy conversion. Molybdenum disulfide can also be used as a catalyst for the dehydrogenation of complex hydrocarbons.

  News November 18, 2021
• Copper zinc tin sulfur solar cell materials

  Copper Zinc Tin sulfur selenium cu2ZnSnSXSE4-X (CZTSSe) is a new generation of light absorption layer material for thin film solar cells. The material has similar crystal structure and material properties to copper indium gallium selenium CuInXGa1-XSe2 (CIGS), which is currently outstanding in the field of thin film solar cells. Copper, Zinc, tin, sulfur and selenium have high light absorption coefficient (greater than 104cm-1), adjustable band gap (1.0-1.5eV) and good photodepletion resistance.

  News November 17, 2021
• Six applications of magnetron sputtering coating

  Magnetron sputtering method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage.

  News November 16, 2021
• Overview of four kinds of sputtering targets commonly used in four fields

  High purity sputtering target, including aluminum target, titanium target, tantalum target, tungsten titanium target, etc. Sputtering target mainly involves four fields: flat panel display, semiconductor, storage and solar cell.

  News November 15, 2021
• Silicon nitride powder

  Silicon nitride is a kind of high hardness, stable structure, low thermal expansion coefficient, oxidation resistance and erosion resistance is very good set of excellent thermal and chemical properties of advanced ceramic materials.

  News November 05, 2021
• What is gallium arsenide used for?

  Gallium arsenide (GaAs) semiconductor materials have high electron mobility (about 5.7 times that of silicon) and wide band gap structure compared with traditional silicon materials.

  News November 04, 2021
• The metal sputtering target

  High purity metal sputtering target material is mainly used in wafer manufacturing and advanced packaging process.

  News November 03, 2021
• What is magnetic sputtering?

  In the fluorescent lamp socket near the common blackening phenomenon, which is the most admired example, this is due to the fluorescent lamp electrode is sputtered and attached to the surrounding formation.

  News November 02, 2021