News

• Four main forming methods for ITO target material

  As we all know, ITO sputtering target is a black gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proportion in a high temperature atmosphere (1600 degrees, oxygen sintering) through a series of production processes. ITO target was used as raw material to oxidize ITO film to glass substrate or flexible organic film by magnetron sputtering. ITO film has conductivity and light transmission, and its thickness is generally 30nm ~ 200nm.

  News December 03, 2021
• Use of zirconia balls

  Zirconia ball belongs to a class of grinding beads, its density 6.0, bulk density 3.2, zirconium 95%, containing about 4.8% yttrium, also known as 95 yttrium stable zirconia ball.

  News December 02, 2021
• Third generation semiconductor - gallium nitride

  Gallium nitride (GaN) is a kind of semiconductor material composed of nitrogen and gallium. Because its band gap width is greater than 2.2eV, it is also known as wide band gap semiconductor material, and also known as the third generation semiconductor material in China.

  News November 19, 2021
• What are the metal materials for 3D printing?

  According to the type of materials, 3D printing metal materials can be divided into iron based alloy, titanium and titanium based alloy, nickel based alloy, cobalt chromium alloy, aluminum alloy, copper alloy and precious metal, etc.

  News November 26, 2021
• Development and status quo of cathode materials for lithium batteries

  At present, the cathode materials of lithium batteries are mainly lithium cobalt acid, lithium manganese acid, lithium iron phosphate and ternary materials. The first stage of the rise of lithium battery cathode materials was dominated by lithium cobalt oxide (LCO) from 2005 to 2011.

  News November 25, 2021
• Nano cerium oxide

  Cerium oxide is a kind of inorganic substance, chemical formula for CeO2, light yellow or yellowish brown powder. Density 7.13g/cm3, melting point 2397℃, insoluble in water and alkali, slightly soluble in acid.

  News November 24, 2021
• What is a target? -- "neglected" core consumables

  Target material is one of the main materials for preparing thin films, which is mainly used in integrated circuits, flat panel displays, solar cells, recording media, intelligent glass, etc., which requires high purity and stability of materials.

  News November 23, 2021
• Sputtering target material used in semiconductor industry

  In today's semiconductor manufacturing process, sputtering target is undoubtedly the most important raw material, and its quality and purity play a key role in the subsequent production quality of the semiconductor industry chain.

  News November 22, 2021
• The use of molybdenum disulfide

  Molybdenum disulfide is an important solid lubricant, especially suitable for high temperature and high pressure. It also has diamagnetic, can be used as a linear photoconductor and display p-type or n-type conductivity of semiconductors, with the role of rectification and energy conversion. Molybdenum disulfide can also be used as a catalyst for the dehydrogenation of complex hydrocarbons.

  News November 18, 2021
• Copper zinc tin sulfur solar cell materials

  Copper Zinc Tin sulfur selenium cu2ZnSnSXSE4-X (CZTSSe) is a new generation of light absorption layer material for thin film solar cells. The material has similar crystal structure and material properties to copper indium gallium selenium CuInXGa1-XSe2 (CIGS), which is currently outstanding in the field of thin film solar cells. Copper, Zinc, tin, sulfur and selenium have high light absorption coefficient (greater than 104cm-1), adjustable band gap (1.0-1.5eV) and good photodepletion resistance.

  News November 17, 2021