News

• Overview of four kinds of sputtering targets commonly used in four fields

  High purity sputtering target, including aluminum target, titanium target, tantalum target, tungsten titanium target, etc. Sputtering target mainly involves four fields: flat panel display, semiconductor, storage and solar cell.

  News November 15, 2021
• Silicon nitride powder

  Silicon nitride is a kind of high hardness, stable structure, low thermal expansion coefficient, oxidation resistance and erosion resistance is very good set of excellent thermal and chemical properties of advanced ceramic materials.

  News November 05, 2021
• What is gallium arsenide used for?

  Gallium arsenide (GaAs) semiconductor materials have high electron mobility (about 5.7 times that of silicon) and wide band gap structure compared with traditional silicon materials.

  News November 04, 2021
• The metal sputtering target

  High purity metal sputtering target material is mainly used in wafer manufacturing and advanced packaging process.

  News November 03, 2021
• What is magnetic sputtering?

  In the fluorescent lamp socket near the common blackening phenomenon, which is the most admired example, this is due to the fluorescent lamp electrode is sputtered and attached to the surrounding formation.

  News November 02, 2021
• What is nickel vanadium?

  Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic.

  News November 01, 2021
• Surface treatment of extruded magnesium

  In the application products of magnesium alloy, pressure machining products, casting products and non-structural applications are three major trends.

  News November 12, 2021
• What is optical coating material?

  There are many causes affecting the transmittance of a plane lens by optical coating. The roughness of the mirror will cause the diffuse of incident light and reduce the transmittance of the lens.

  News November 11, 2021
• High purity metal sputtering target application field

  High purity sputtering target applications mainly include semiconductor, panel, photovoltaic and optical devices. Integrated circuits, flat panel display, solar cells, information storage, tool modification, optical devices, high-grade decorative products and other production processes need to carry out sputtering coating process, sputtering target application field is very broad.

  News November 10, 2021
• Development status of alloying element addition technology

  At present, the main technology of alloying element addition in China includes intermediate alloy addition and alloying element additive addition.The technology of adding intermediate alloy began to be used in China from 1950s to late 1960s.

  News November 09, 2021