What is sputtering target?

Magnetron sputtering coating is a new physical gas phase coating method, which is to use the electron gun system to emit electrons and focus on the coated material, so that the sputtering atoms follow the momentum conversion principle to fly away from the material with a high kinetic energy to the substrate deposition film. This plated material is called the sputtering target.

Application of sputtering target

Sputtering is one of the main technology of preparation of thin film materials, which makes use of the ion, ion source through accelerating gathered in a vacuum, and the formation of a high speed can ion beam, the bombardment of solid surface, ions and solid surface atomic momentum exchange, from solid surface atomic solid and deposition in the basal surface, bombarded solid is sputtering deposition film of raw materials. It is called sputtering target material. Various types of sputtering thin film materials have been widely used in semiconductor integrated circuits, recording media, planar display and workpiece surface coating. The high temperature and high vacuum environment in the reaction chamber causes these metal atoms to form grains, which are then micropatterned and etched into layers of metal wires that transmit data on the chip. 

Sputtering target is mainly used in electronics and information industry, such as integrated circuits, information storage, LIQUID crystal display, laser memory, electronic control devices, etc. Can also be used in glass coating field; It can also be used in wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries.