Niobium Oxide (NbOx)-Spray Rotary Sputtering Target

Product Description

Characteristic


Chemical composition and physical properties of the product:

Chemical formula: Nb2Ox (x<5)

Resistivity (20 ° C) : 0.1 or less Ω. Cm

Molding process: spraying

Density: >4.3g/cm3 gt;95%)

Purity: > 99.95%

Impurity content (unit: PPM, total impurity content ≤ 500ppm)

Packing method: vacuum sealed packing, using standard export wooden cases.


Application


Mainly used in low-e glass film system, thin film solar cell electrode film system,TFT, semiconductor.

MSDS

Product Inquire

Silicon (Si)-Spray Rotary Sputtering Target

Titanium Oxide (TiOx)-Spray Rotary Sputtering Target

Ytterbium Metal (Yb)-Rotary Sputtering Target

Aluminum Metal (Al)-Rotary Sputtering Target