Aluminum Metal (Al)-Rotary Sputtering Target
Product Description
Characteristic
Chemical composition and physical properties of the product:
Chemical formula: Al
Molding process: spraying
Density: > 2.6 g/cm3
Purity: > 99.9%
Impurity content (unit: PPM, total impurity content ≤ 1000ppm)
Application
Mainly used for surface decoration and functional coating and evaporation materials, semiconductor electronics, TFT, flat display.