Article List

• High purity tungsten target material (chip manufacturing)

  High purity tungsten target​ is an important substrate for the transition of tungsten oxide film in semiconductor devices. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy. The preparation method includes the purity of 99.999% or more, particle size of 3.2 4.2μm tungsten powder for uniform mixing, placed in the vacuum heat treatment furnace for pre-degassing, and then into hydrogen, continue heating degassing steps

  News February 09, 2022
• Nanomaterials' application in various fields

  Application of nanomaterials​ in various fields Nanomaterials have volume effect, surface effect, quantum size effect, macroscopic quantum tunneling effect and so on, which make them present characteristics that conventional materials do not have in electricity, magnetism, light and other aspects. Scientists and engineers have solved many technical problems by using the special properties of nanomaterials.

  News February 08, 2022
• Silicon carbide (SiC)：third generation semiconductor material

  Based on silicon devices on the design and development has undergone many generations of the structure and process optimization and renewal, is gradually close to the limit of the silicon material, based on the potential to improve the performance of silicon devices become more and more small to gallium nitride, silicon carbide​ as a representative of the third generation of semiconductor have excellent physical properties of materials in order to further improve the performance of the power electronics device provides a bigger space.

  News February 07, 2022
• Boride target and related parameters

  LaB6 target material, melting point 2230℃, density 4.7g/cm3, resistivity 15μ ω ·cm, Vickers hardness 27.7 Gpa. TiB2 target, melting point 2980℃, density 4.5g/cm3, resistivity 9~15μ ω ·cm, Vickers hardness 33.5 Gpa. ZrB2 target material, melting point 3040℃, density 6.1g/cm3, resistivity 7-10 μ ω ·cm, Vickers hardness 22.5 Gpa.

  News January 27, 2022
• What are the requirements of 3D printing on the performance of metal powder?

  What conditions do metal powders need to meet in order to meet the requirements of 3D printing materials? Ceramic inclusions will significantly reduce the performance of the final product, and these inclusions generally have a high melting point and are difficult to be sintered, so no ceramic inclusions must be in the powder.

  News January 28, 2022
• What are the material requirements for evaporation source in vacuum coating?

  Generally, the material and shape of the evaporation source should be considered. The general requirements of the evaporation source material​ are: The high melting point Because the evaporation temperature of the evaporating material (the temperature of the equilibrium vapor pressure of 1.3Pa) is mostly between 1000~2000℃, therefore, the melting point of the evaporating source material should be higher than this temperature.

  News January 26, 2022
• Silicon nitride ceramics' properties

  Silicon nitride​ (Si3N4) is a kind of ceramic material with high melting point and high hardness and chemical inertness. Hot-pressed silicon nitride, in particular, is one of the hardest substances in the world. Silicon nitride ceramics have low thermal expansion coefficient and high thermal conductivity, so they have excellent thermal shock resistance.

  News January 25, 2022
• Ceramic targets-what are the types of them?

  According to the application, it can be divided into semiconductor associated ceramic target​, display ceramic target, magnetic recording ceramic target, optical recording ceramic target, superconducting ceramic target, giant magnetoresistance ceramic target, etc. Semiconductor association ceramic target material (HfO, the SiO, Si3N4, MoSi, slipped, WSi, TiSi, PLZT, ITO, is mainly used in gate dielectric film.

  News January 24, 2022
• Nanomaterials' properties

  Nanomaterials​ refer to ultrafine materials with a grain size of nanometer level (1 m). Their sizes are between molecules, atoms and bulk materials. They generally refer to tiny solid powders in the range of 1 ~ 100nm. Nanomaterial is a kind of third kind of solid material which is different from both crystalline and amorphous state.

  News January 21, 2022
• Titanium dioxide film's application

  Titanium dioxide ​(TiO2) is a hard and chemically resistant white titanium oxide. Titanium dioxide (TiO2) sputtering target can be used to obtain high quality titanium dioxide thin film, which has been widely used in various applications due to its coating characteristics. Titanium dioxide film provides opacity and durability while helping to ensure paint life and paint surface protection.

  News January 20, 2022