News

• Magnetron sputtering coating application in common fields

  Magnetron sputtering​ method can be used to prepare a variety of materials, such as metals, semiconductors, insulators, etc. It has the advantages of simple equipment, easy control, large coating area, strong adhesion and so on. Magnetron sputtering development so far, in addition to the advantages of the general sputtering method, but also to achieve high speed, low temperature, low damage.

  News March 08, 2022
• Sputtering target why to bind back target

  Sputtering targets are mainly used in electronic information industry, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices, etc. It can also be used in glass coating, wear-resistant materials, high temperature corrosion resistance, high-grade decorative products and other industries. Bonding refers to bonding a target to a back target with solder.

  News March 07, 2022
• Ceramic targets-three main factors affecting the properties of it

  The purity of ceramic target​ has a great influence on the performance of sputtering film. The higher the purity is, the better the uniformity of sputtering film and the quality of batch products. In addition, in order to prepare high performance ceramic target, we should control these factors, mainly including molding method, raw material size, sintering effect, today to analyze the main factors affecting the performance of ceramic target are those.

  News March 04, 2022
• Aluminium nitride's application

  Aluminum nitride​ has high resistivity, high thermal conductivity (8-10 times of Al2O3), and low expansion coefficient similar to silicon, making it an ideal material for high temperature and high power electronic devices. Commonly used ceramic substrate materials are beryllium oxide, alumina, aluminum nitride, etc., among which alumina ceramic substrate thermal conductivity is low, thermal expansion coefficient and silicon do not match;

  News March 03, 2022
• What is chrome oxide powder?

  Chromic oxide green, hexagonal or amorphous dark green powder with metallic luster. It usually comes in two shades: light olive green and dark olive green, with metallic tints. Relative density 5.21, melting point: 2266℃, boiling point 4000℃. Excellent heat resistance, can withstand temperature 1000℃ without discoloration, acid resistance, alkali resistance is also quite good. High purity, small particle size, uniform distribution, crystal very hard.

  News March 02, 2022
• Cerium oxide in polishing

  Cerium oxide​ polishing powder (VK-CE01) polishing powder has the advantages of strong cutting ability, high polishing efficiency, high polishing accuracy, good polishing quality, clean operating environment, small pollution, long service life and so on, and plays an extremely important role in optical precision polishing and CMP and other fields.

  News March 01, 2022
• PVD sputtering target's introduction

  Physical vapor deposition (PVD) is a thin-film preparation technique that physically vaporizes the surface of a target into gaseous atoms, molecules, or parts into ions under vacuum conditions. A film with a specific function is then deposited on the surface of the substrate via a low-pressure gas (or plasma). The main methods of physical vapor deposition include vacuum evaporation, sputtering deposition, arc plasma plating, ion plating, etc.

  News February 28, 2022
• The ternary materials

  Common cathode materials for lithium batteries mainly include lithium cobalt acid (LCO), lithium manganese acid (LMO), lithium iron phosphate (LFP), ternary materials (NCM/NCA), etc. Ternary (LICoxMNyNi1-X-YO2), with a-NafEO2 layered structure (R-3M space group), has a theoretical capacity of about 275 mAh/g.

  News February 24, 2022
• Targets-semiconductor manufacturing materials

  The target material​ is the material of making thin film, using the target material bombarded by high-speed charged particles, through different laser (ion beam) and different target material interaction to get different membrane system, to achieve the function of conduction and blocking. Therefore, the target is also called "sputtering target". His working principle is to use the ions generated by the ion source to gather and accelerate in vacuum

  News February 25, 2022
• Semiconductor materials' characteristics and applications

  Semiconductor materials are a kind of electronic materials which have semiconductor properties and are used to make semiconductor devices. Semiconductor material is the foundation of semiconductor industry, and its development has great influence on the development of semiconductor technology. So what are the characteristics and applications of semiconductor materials?

  News February 23, 2022