Titanium Silicide (TiSi2)-Sputtering Target
Product Description
Characteristic
Titanium disilicide (TiSi2) is an inorganic chemical compound.
Chemical formula：TiSi2
Molar mass：104.038 g/mol
Appearance：black orthorhombic crystals
Density：4.02 g/cm3
Melting point：1,470 °C (2,680 °F; 1,740 K)
Solubility in water：insoluble
Solubility： soluble in HF
Application
Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.