Target material's making method, classification and application

Making method of sputtering target materials

At present, the target materials are mainly prepared by casting and powder metallurgy.

1. Casting method: the alloy raw material with a certain composition ratio is melted, and then the alloy solution is poured into the mold to form ingot, and finally the target is made by mechanical processing, and the casting method is melted and cast in vacuum. The commonly used smelting methods are vacuum induction smelting, vacuum arc smelting and vacuum electron bombardment smelting, etc. Its advantages are the target impurity content (especially gas impurity content) is low, high density, can be large-scale;  The disadvantage is that for two or more metals with different melting points and densities, it is difficult to obtain uniform alloy targets by ordinary melting method.  

2. Powder metallurgy method: the alloy raw materials with a certain composition ratio are melted, poured into ingots and then crushed. The crushed powder is formed by isostatic pressing, and then sintered at high temperature, and finally forms the target material. Its advantage is that the target material is uniform in composition;  Disadvantages are low density, high impurity content, commonly used powder metallurgy process including cold pressing, vacuum hot pressing and hot isostatic pressing.

Classification and application of sputtering target

According to different material target can be divided into: metal target, ceramic (oxide, nitride, etc.) target, alloy target.  

According to different application directions, it can be divided into:  

1. Semiconductor related target: electrode, wiring film: aluminum target, copper target, gold target, silver target, palladium target, platinum target, aluminum silicon alloy target, aluminum silicon copper alloy target, etc.  Storage electrode film: molybdenum target, tungsten target, titanium target, etc.  Adhesion film: tungsten target, titanium target, etc.  Capacitor insulation film: lead zirconate titanate target material.  

2. Magnetic recording target: vertical magnetic recording film: cobalt-chromium alloy target, etc. Hard disk film: cobalt-cr-ta alloy target, cobalt-cr-PT alloy target, cobalt-cr-ta platinum alloy target, etc. Film head: cobalt tantalum chromium alloy target, cobalt chromium zirconium alloy target, etc. Iol film: cobalt-platinum alloy target, cobalt-palladium alloy target, etc.  

3. Optical recording target: phase change CD recording film: telluride target, antimony selenide target, germanium antimony telluride alloy target, germanium telluride alloy target, etc.  Magnetic disc recording films: Dysprosium iron cobalt alloy target, terbium iron and cobalt alloy target, terbium iron and cobalt alloy target, alumina target, magnesium oxide target, silicon nitride target, etc.  Optical disc reflection film: al target, al ti target, al cr target, gold target, gold alloy target, etc. CD protection film: silicon nitride target, silicon oxide target, zinc sulfide target, etc.  

4. Display target: transparent conductive film: indium tin oxide target, zinc oxide aluminum target, etc.  Electrode wiring film: molybdenum target, tungsten target, titanium target, tantalum target, chromium target, aluminum target, aluminum titanium alloy target, aluminum tantalum alloy target, etc.  Electroluminescent films: zinc sulfide doped manganese target, zinc sulfide doped terbium target, calcium sulfide doped europium target, yttrium oxide target, tantalum oxide target, barium titanate target, etc.  

5. Other application target: decorative film: titanium target, zirconium target, chromium target, titanium aluminum alloy target, stainless steel target, etc.  Low resistance film: ni-cr alloy target, ni-Cr silicon alloy target, ni-CR aluminum alloy target, ni-Cu alloy target, etc.  Superconducting film: YbCO target, bismuth strontium calcium copper oxygen target.  Tool plating film: nitride target, carbide target, boride target, chromium target, titanium target, titanium aluminum target, zirconium target, graphite target, etc.