Oxide Ceramic Sputtering Target
- Titanium Oxide (Ti4O7)-Sputtering Target
- Titanium Monoxide (TiO)-Sputtering Target
- Aluminum Oxynitride (AlON)-Sputtering Target
- Bismuth Oxide (Bi2O3)-Sputtering Target
- Tungsten Oxide (WO3)-Sputtering Target
- Fluorine-doped Tin Oxide (SnO2-SnF2 （90:10 Wt%）)-Sputtering Target
- Indium Tin Oxide (In2O3-SnO2 （90:10 Wt%）)-Sputtering Target
- Indium-Gallium-Zinc Oxide (In2O3-Ga2O3-ZnO （1:1:1 Mol%）)-Sputtering Target
- Indium Oxide-Gallium Oxide (In2O3-Ga2O3)-Sputtering Target
- Indium Oxide-Titanium Oxide (In2O3-TiO2 （91:9 Wt%）)-Sputtering Target