Article List

• Cadmium arsenide application

  Cadmium arsenide is a chemical compound of cadmium and arsenic. It is a semiconductor and is used in infrared detectors, pressure sensors, magnetoresistors, and photodetectors.

  News October 28, 2021
• Zinc selenide introduction

  Zinc Selenide oxidizes significantly at 300°C, exhibits plastic deformation at about 500°C and dissociates about 700°C. For safety, Zinc Selenide windows should not be used above 250°C in normal atmosphere.

  News October 27, 2021
• Magnetron sputtering coating

  Magnetron sputtering, as a very effective method for thin film deposition, has been widely and successfully applied in many fields, especially in the fields of microelectronics, optical thin film and material surface treatment, for thin film deposition and surface coating preparation.

  News October 26, 2021
• Several common film coating coatings

  In recent years, functional films of polymer substrates have been more and more widely used in various fields, especially for films with optical functions. Polymer films (such as PET, PC, PMMA, PVC, TAC, etc.) have excellent optical and physical and mechanical properties.

  News October 25, 2021
• What is gallium arsenide?

  Gallium arsenide (GaAs) is a compound built from the elements gallium and arsenic. It is often referred to as a III-V compound because gallium and arsenic are in the III group and V group of the periodic table, respectively.

  News October 22, 2021
• Molybdenum diselenide introduction

  Molybdenum diselenide (MoSe2) is an inorganic compound of molybdenum and selenium. Its structure is similar to that of MoS2. Compounds of this category are known as transition metal dichalcogenides, abbreviated TMDCs.

  News October 21, 2021
• Copper indium gallium selenide application

  Copper indium gallium selenideCopper indium gallium (di)selenide (CIGS) is a I-III-VI2 semiconductor material composed of copper, indium, gallium, and selenium. The material is a solid solution of copper indium selenide (often abbreviated "CIS") and copper gallium selenide.

  News October 20, 2021
• Application of plasma in surface coating technology

  Sputtering is the use of high speed ion impact solid sputtering target, so that the surface molecules splash and projected onto the substrate to form a film.The initial kinetic energy of the sputtering ion is about 100 eV.A common plasma gas is argon.

  News October 18, 2021
• ITO sputtering target

  ITO sputtering target and its derivatives, such as ITO film and ITO glass, are widely used in all walks of life.ITO targets are commonly used to make transparent conductive coatings for liquid crystal displays (LCDS), flat panel displays, plasma displays and touch panels.

  News October 19, 2021
• Sputtering targets' introduction

  Sputtering is a physical vapor deposition (PVD) mechanism in which atoms are ejected from the surface of a material when that surface is stuck by sufficiently high energy particles.

  News October 15, 2021