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- Monocrystalline silicon and polycrystalline silicon's differenceMonocrystalline silicon has two isomorphous, crystalline and amorphous forms. Crystalline silicon is further divided into single crystal silicon and polycrystalline silicon, both of which have a diamond lattice. The crystal is hard and brittle, has a metallic luster, and is electrically conductive, bNews July 22, 2021
- Target material of sputtering's meaningTo repeatedly used in very large scale integrated circuit manufacturing process of Sputtering, Sputtering process of physical vapor deposition (PVD) technology, is one of the main technology of electronic thin film materials preparation, which makes use of the ion, ion source through accelerating gaNews July 20, 2021
- Bismuth oxide's classificationBismuth (III) oxide is an important compound of Bismuth, Bismuth oxide has two kinds of crystal structure: Alpha type and Beta type. Compared with beta Bismuth oxide, alpha Bismuth oxide is more stable in high temperature and has more common use of electronic materials, thermistor, glass coloring, vNews July 21, 2021
- The ITO replacement for flexible panelsIndium-Tin Oxide (ITO) has been widely used as transparent conducting material for various display devices. Whereas this material has some problems, such as the conductivity and the flexibility. High conductivity is required for responsivity when the panel size becomes larger. Flexibility is requireNews July 19, 2021
- AZO Sputtering TargetAZO sputtering target, or aluminum-doped zinc oxide target, contains the element of Al, Zn and O.Purity: 99%, 99.9%, 99.99%.Circular: Diameter <= 14 inch, Thickness>= 1 mm;Block: Length <= 32 inch, Width <= 12 inch, Thickness>= 1 mm.High Purity AZO sputtering targets are available in various formsNews July 16, 2021
- Indium ingot's introductionIndium is a white metal, extremely soft, extremely malleable and ductile. Cold weldability, and other metal friction can be attached, liquid indium excellent mobility. The metal indium is not oxidized by air at normal temperature, the indium starts to be oxidized at about 100ºC, (At temperatures aboNews July 15, 2021
- Nano Al2O3 +TiO2 technology of magnesium surface plasma spraying97% Al2O3+3%TiO2 nano-ceramic layer was sprayed on the surface of AZ91D magnesium alloy by plasma spraying. The ceramic particle size was 150nm and 120nm, and the coating thickness was 50μm ~ 100μm. The thermal efficiency ηQ was about 65%. The surface of the sample is preheated to 100℃ before sprayNews July 14, 2021
- Perovskite solar cells' performance is expected to improveRecently, Nature Photonics published online the research results of Wuhan University, Hong Kong Polytechnic University and University of California, Los Angeles on perovskite solar cells with stable, low open-circuit voltage loss through multi-functional passivation. This research method is expecteNews July 12, 2021
- Sputtering targets have the important rolesSputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas.News July 09, 2021