News

• Application and characteristics of boron carbide

  Boron carbide​ is the superhard material whose hardness is only second to diamond and cubic boron nitride, with hardness up to 3000 kg/mm2. Low density, only 2.52g /cm3, is 1/3 of steel; High elastic modulus, 450 GPa; High melting point, about 2447℃; Its thermal expansion coefficient is low, high thermal conductivity. Boron carbide is a kind of nonmetallic ceramic material, gray black, has many excellent physical and chemical properties

  News May 26, 2022
• Titanium sputtering target material

  The target material is the target material bombarded by high speed charged particles. There are metals, alloys, oxides and so on. Change different target material (such as aluminum, copper, stainless steel, titanium, nickel target, etc.), can get different film system (such as super hard, wear resistant, corrosion resistant alloy film, etc.).

  News May 25, 2022
• Today we talk about cadmium

  Cadmium was discovered in 1817 by Strohmeier, a professor of chemical medicine at the University of Gottingen in Germany. In 1990, FAO and the World Health Organization divided trace elements into three categories. The first category is essential to human body, there are 8 kinds, including iodine, iron, zinc, selenium, copper, molybdenum, chromium and cobalt.

  News May 24, 2022
• Tungsten trioxide product series

  Tungsten trioxide, chemical formula: WO3, is the oxide of tungsten (VI), which is an important intermediate of tungsten industry from tungsten ore. Yellow powder, melting point: 1472℃, relative density (water =1) 7.16, boiling point 1837℃; Insoluble in water, soluble in lye, slightly soluble in acid. It can be obtained by adding acid after eumelting tungsten ore and soda.

  News May 23, 2022
• Sputtering target - "neglected" core consumables

  Target material​ is one of the main materials for preparing thin films, which is mainly used in integrated circuits, flat panel displays, solar cells, recording media, intelligent glass, etc., which requires high purity and stability of materials. Sputtering target working principle: Sputtering is one of the main technology of preparation of thin film materials, which makes use of the ion

  News May 20, 2022
• Very "magnesium" is very strong, crack plastic poor!

  As the lightest metal structure material, magnesium​ has broad application prospects in aerospace, automotive, high-speed rail, electronic products and medical and other fields. However, compared with traditional metal materials, magnesium has poor plasticity, difficult deformation processing of profiles and parts, and high process cost. This severely restricts the wide application of magnesium as a structural material.

  News May 19, 2022
• Crucible material selection for OLED evaporation

  In the manufacturing process of OLED, "evaporation" is the essence part but also the difficulty. It refers to a coating technology in which the materials to be evaporated are heated by resistance or electron beam, and the atoms are vaporized by crucible in the vacuum chamber to reach and adhere to the substrate surface under high vacuum condition.

  News May 18, 2022
• The difference between alumina, pseudo-boehmite and boehmite

  In the world, people generally "alumina" is divided into two categories: metallurgical grade alumina and non-metallurgical grade alumina. Non-metallurgical grade alumina is also known as multiple varieties of alumina, chemical alumina. Among them, pseudo-boehmite, boehmite, super fine aluminum hydroxide, activated alumina, calcined alumina and corundum are all belong to the chemical alumina this category.

  News May 17, 2022
• Electronic grade polysilicon: "Food" of electronic Information Industry

  High purity polysilicon​ material is the basic raw material of information industry and solar photovoltaic power generation industry. Many developed countries regard it as a strategic material. Electronic-grade polysilicon is one of the most basic and main raw materials for manufacturing semiconductor silicon wafers, known as the "food" of the electronic information industry, with purity requirements of 99.999999999% ~ 99.999999999% (9N ~ 11N).

  News May 16, 2022
• Semiconductor chip material king- sputtering target material

  In the chip industry, sputtering target​ is a necessary raw material for vlSI manufacturing. Which makes use of the ion, ion source through accelerating gathered in the high vacuum, and the formation of a high speed can ion beam, the bombardment of solid surface, ions and solid surface atomic momentum exchange, from solid surface atomic solid and deposition in the basal surface, bombarded solid is sputtering deposition film of raw materials, known as the sputtering target materials.

  News May 13, 2022